BIN SAION, M. P. Advanced Methods for Dispatching problems in Photolithography Area. International Journal of New Practices in Management and Engineering, [S. l.], v. 11, n. 1S, p. 20–22, 2021. DOI: 10.17762/ijnpme.v11i1S.140. Disponível em: https://ijnpme.org/index.php/IJNPME/article/view/140. Acesso em: 2 oct. 2025.